Electrically charged selectivity of poly-para-xylylene deposition

Chih-Yu Wu, Ho-Yi Sun, Wei-Chieh Liang, Hung-Lun Hsu, Hsin-Ying Ho, Yu-Ming Chen, Hsie...
The bottom-up patterning approach provides intrinsic advantages associated with unlimited resolution but is limited by the materials available for selection. A general and simple approach towards the selective deposition of poly-para-xylylenes is introduced in this communication. The chemical vapour deposition (CVD) of poly-para-xylylenes is inhibited on the high-energy surfaces of electrically charged conducting substrates. This technology provides an approach to selectively deposit poly-para-xylylenes irrespective of the substituted functionality and to pattern these polymer thin films from the bottom up.